AVS 63rd International Symposium & Exhibition | |
2D Materials Focus Topic | Thursday Sessions |
Session 2D-ThP |
Session: | 2D Materials Poster Session |
Presenter: | Masahiro Soga, Kyoto University, Japan |
Authors: | M. Soga, Kyoto University, Japan Y. Tu, Kyoto University, Japan T. Utsunomiya, Kyoto University, Japan T. Ichii, Kyoto University, Japan H. Sugimura, Kyoto University, Japan |
Correspondent: | Click to Email |
Chemical doping on graphene and its derivatives is a powerful technique for modulating their electronic properties1. Especially, nitrogen doping can help the electron transfer and enhance the electrocatalytic activity. Nitrogen doped graphene have been synthesized by thermal annealing approach and hydrothermal reduction of graphene oxide (GO) in the presene of N2H4 and NH3 in general1, 2. However, these methods are high cost, complicated and suffer from toxic chemicals. In this research, nitrogen doped and reduced graphene oxide (N-rGO) was synthesized by vacuum ultraviolet (VUV) irradiation.
Colloidal dispersion of GO sheets was prepared by the modified Hummers’ method. NH3 aqueous solution (14.8 M) was added to the GO dispersion and was magnetically stirred for 24 hours. After that, the dispersion was centrifuged at 13.5 krpm for 10 min and washed ten times with ultra pure water, and then aqueous dispersion of nitrogen modified GO (N-GO) was obtained. the N-GO dispersion was spincoated on Si substrate and VUV light (λ = 172 nm, 10 mW cm-2) was irradiated on this sample under high vacuum condition (< 10-3 Pa) for 64 min. The sample were characterized by Fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS).
XPS and FT-IR analysis of the samples revealed that chemically reactive oxygen functional groups in a GO sheet reacted with ammonia and the formation of C-N bond proceeded after stirring in NH3 aqueous solutiom. After VUV irradiation, XPS and FT-IR analysis showed that N-GO was reduced and bonding configuration of nitrogen was changed.
1. X. Li, H. Wang, J. T. Robinson, H. Sanchez, G. Diankov, H. Dai, J. Am. Chem. Soc. 131, 15939 (2009)
2. D. Long, W. Li, J. Miyawaki, I. Mochida, S. Yoon, Langmuir 26, 16096 (2010)