| AVS 62nd International Symposium & Exhibition | |
| Thin Film | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+SS-WeM1 Invited Paper High Performance Precursors for Atomic Layer Deposition of Silicon Containing Films Anu Mallikarjunan, Air Products and Chemicals, Inc. |
| 8:40am | TF+SS-WeM3 Amorphous In2O3 and Sn-doped In2O3 Layers by ALD Prepared using Trimethyl Indium and Ozone Anil Mane, A. Allen, Argonne National Laboratory, R. Kanjolia, SAFC Hitech, J. Elam, Argonne National Laboratory |
| 9:00am | TF+SS-WeM4 Towards Organic Electronics: Atomic Layer Like Deposition of ZnS and ZnO on Organic Thin Films Z. Shi, Amy Walker, University of Texas at Dallas |
| 9:20am | TF+SS-WeM5 AlF3 Atomic Layer Deposition or Al2O3 Atomic Layer Etching from Sequential Exposures of Trimethylaluminum and HF Jaime DuMont, Y. Lee, S.M. George, University of Colorado at Boulder |
| 9:40am | TF+SS-WeM6 A Comparison of Water Delivery Methods for Atomic Layer Deposition Tariq Ahmido, W.A. Kimes, B.A. Sperling, J.E. Maslar, NIST |
| 11:00am | TF+SS-WeM10 Stoichiometric Dependence of the Interface of HfO2 ZrO2, TiO2, Ta2O5 and La2O3 on Si (100) by ALD Pierre Mani, Universidad Autónoma de Ciudad Juárez-IIT, Mexico, E. Lopez, Universidad Autónoma de San Luis Potosí, Mexico, H. Leos, Universidad Autónoma de Ciudad Juárez-IIT, Mexico, H. Hernandez, Universidad Autónoma de San Luis Potosí, Mexico, J.A. Hernandez, J.R. Farias, J.T. Elizalde, Universidad Autónoma de Ciudad Juárez-IIT, Mexico, M.A. Melendez, CINVESTAV, Mexico, M.A. Vidal, Universidad Autónoma de San Luis Potosí, Mexico |
| 11:20am | TF+SS-WeM11 In-situ Infrared Study of Atomic Layer Deposition of Molybdenum Nitride using Bis(tert-Butylimido)-Bis(dimethylamido) Molybdenum and Hydrazine Abraham Vega, C.E. Nanayakkara, The University of Texas at Dallas, G. Liu, R. Kanjolia, SAFC Hitech, Y.J. Chabal, The University of Texas at Dallas |
| 11:40am | TF+SS-WeM12 Atomic-Layer-Deposited In2O3:H Transparent Conductive Oxides: How to Achieve the Best Possible Carrier Mobility Bart Macco, Eindhoven University of Technology, Netherlands, H.C.M. Knoops, Oxford Instruments Plasma Technology, UK, M.A. Verheijen, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
| 12:00pm | TF+SS-WeM13 Mechanical Property and Corrosion Resistance Evaluation of CrVN and CrSiN Thin Films Grown by a Hybrid High Power Impulse Magnetron Sputtering and Radio Frequency Sputtering Technique Jyh-Wei Lee, C.Y. Cheng, P.W. Chang, Ming Chi University of Technology, Taiwan, Taiwan, Republic of China, B.S. Lou, Chang Gung University, Taiwan, Taiwan, Republic of China |