| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | PS+TF-WeA1 Invited Paper Plasma Prize Talk: Plasma Processing of Materials: What makes Plasma Special and Future Outlook? Richard van de Sanden, DIFFER |
| 3:00pm | PS+TF-WeA3 Feature Scale Simulation of Atomic Layer Deposition via FPS3D Paul Moroz, Tokyo Electron US Holdings, D.J. Moroz, University of Pennsylvania |
| 3:20pm | PS+TF-WeA4 Plasma Enhanced Atomic Layer Deposition Applications using an Ion Source F. Papa, Gencoa USA, V. Bellido-Gonzalez, H. Li, Gencoa Ltd, UK, HD. Ngo, University of Applied Sciences Berlin, Germany, K. Kröhnert, Fraunhofer Institut IZM Berlin, Germany, O. Ehrmann, K.D. Lang, P. Mackowiak, Piotr, TU Berlin, Germany, William Sproul, Reactive Sputtering, Inc |
| 4:20pm | PS+TF-WeA7 Plasma-Assisted ALD of SiNx: The Surface Chemistry Studied by Infrared Spectroscopy Roger Bosch, L.E. Cornelissen, C.K. Ande, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 4:40pm | PS+TF-WeA8 Structural Characterization of Surface Dielectric Barrier Discharges (SDBD) for Atmospheric Pressure Plasma Enhanced Spatial ALD (PE-S-ALD) Yves Creyghton, J. Emmelkamp, F. Roozeboom, TNO Technical Sciences, Netherlands |
| 5:00pm | PS+TF-WeA9 Invited Paper Plasma Deposited Barrier Coatings on Plastics: Plasma Characterization and Thin Film Analysis Peter Awakowicz, F. Mitschker, Ruhr-University Bochum, Germany, A. Nave, INP-Greifswald, Germany, J. Röpcke, INP-Greifswald, G. Grundmeier, Univ. of Paderborn |
| 5:40pm | PS+TF-WeA11 Flexible, Durable, Self-Cleaning Optical Coatings for Optoelectronics Thomas Fuerst, C.A. Wolden, Colorado School of Mines |
| 6:00pm | PS+TF-WeA12 Microwave Plasma Assisted Chemical Vapor Deposition of High Quality, Single Crystal Diamond Substrates Shreya Nad, Y. Gu, J. Asmussen, Michigan State University |