AVS 62nd International Symposium & Exhibition
    Vacuum Technology Monday Sessions
       Session VT-MoA

Paper VT-MoA6
Deposition of Non-Evaporative Getters (NEG) in Very Narrow Chambers

Monday, October 19, 2015, 4:00 pm, Room 230B

Session: Extreme High Vacuum
Presenter: Andre Anders, Lawrence Berkeley National Laboratory
Authors: A. Anders, Lawrence Berkeley National Laboratory
X. Zhou, Lawrence Berkeley National Laboratory
Y. Yang, Lawrence Berkeley National Laboratory
C. Swenson, Lawrence Berkeley National Laboratory
Correspondent: Click to Email

Several next-generation accelerators require much narrower beam pipes than in the past in order to gain better control of beam position and shape. For example, diffraction-limited synchrotrons currently under construction or in the design phase call for vacuum chambers as narrow as 4 mm at certain sections. For such narrow chambers, the vacuum conductance is greatly reduced making it difficult to reach the ultrahigh vacuum requirements that are customarily required for accelerators. The solution seems clear: the beam pipes and other vacuum components have to be the pump. Non-evaporative getters (NEG) coatings are the straight-forward answer to these challenges. In this contribution we report about progress to coat very narrow vacuum chambers with NEG coatings using pulsed sputtering techniques at relatively high process gas pressures. We discuss deposition rates, film composition, various issues encountered and initial tests of pumping performance.

This work was supported by the Laboratory Directed Research and Development Program of Lawrence Berkeley National Laboratory under U.S. Department of Energy Contract No. DE-AC02-05CH11231.