| AVS 62nd International Symposium & Exhibition | |
| Thin Film | Tuesday Sessions |
| Session TF-TuA |
| Session: | ALD for Emerging Applications |
| Presenter: | Shaista Babar, Argonne National Laboratory |
| Authors: | S. Babar, Argonne National Laboratory A. Mane, Argonne National Laboratory A. O'Mahony, Incom, Inc. A. Yanguas-Gil, Argonne National Laboratory J. W. Elam, Argonne National Laboratory |
| Correspondent: | Click to Email |
A highly robust W:Al2O3 nanocomposite material has been reported by ALD method and used in microchannel plates (MCPs) and MEMS devices [1,2]. By adjusting the W cycle percentage during the nanocomposite synthesis, the resistivity can be tuned in the range of 1012 – 108 Ω. Here we report a systematic study of the structure and optical properties of ALD deposited nanocomposite W:Al2O3 films using SEM, TEM, XRD, XRR, XPS, ellipsometry and UV-vis-IR spectroscopy. General oscillator and Kramers-Kronig consistent B-spline models were used to extract the optical constants of the films. We studied the impact of the composition and microstructure on the optical properties of W:Al2O3 layers as ALD cycle ratio and metal contents. We report a systematic decrease in the bandgap associated with the increase in the W content. We also discuss the high thermal stability and high absorptivity of W:Al2O3 and propose it as an ideal candidate for concentrated solar power receivers .
References:
[1] Atomic layer deposition of W:Al2O3 nano-composite films with tunable resistivity,
Anil U. Mane, Jeffrey W. Elam, Chemical Vapor Deposition, 19(4-6), (2013) 186
[2] Nanostructured composite thin films with tailored resistivity by atomic layer deposition
Anil U. Mane, Jeffrey W. Elam, SPIE 2013