Paper TF-ThP2
The Nano-power Generator Fabricated with Thin Atomic Layer Deposited Films

Thursday, October 22, 2015, 6:00 pm, Room Hall 3

The energy of low power infrared (IR) radiation can be transferred to a power generator (PG) device and transformed into usable power [1, 2]. This process, called IR power generation, is demonstrated with commercially available PG devices [1, 2]. However, active media, such as Nb-doped TiO₂ films, can be fabricated in the form of thin films [3]. Voltage production through IR power generation was recently realized using atomic layer deposited (ALD) films [4], but not optimized. This poster outlines the strategies in terms of film architecture and fabrication method that can be employed to increase the efficiency of nano-PG devices fabricated via ALD.

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[2] Y. Schwab, H. S. Mann, B. N. Lang, J. L. Lancaster, R. J. Parise, A. J. Vincent-Johnson, and G. Scarel, Complexity 19, 44-55 (2013).

[3] J. Niemelä, H. Yamauchi, and M. Karppinen, Thin Solid Films551, 19-22 (2014).

[4] H.S. Mann, B.N. Lang, Y. Schwab, J.-P. Niemelä, M. Karppinen, and G. Scarel, J. Vac. Sci. Technol. A 33, 01A124 (2015).