| AVS 62nd International Symposium & Exhibition | |
| Thin Film | Wednesday Sessions |
| Session TF+AS+EM+EN+MN-WeA |
| Session: | CV Infiltration Methods and Energetic and Thermal Properties of Thin Films |
| Presenter: | David Adams, Sandia National Laboratories |
| Authors: | D.P. Adams, Sandia National Laboratories R.V. Reeves, Sandia National Laboratories M. Hobbs, Sandia National Laboratories |
| Correspondent: | Click to Email |
Reactive multilayers grown by sputter deposition have recently attracted interest for applications including material joining (soldering, brazing) and energy sources. For these applications, a metal-metal multilayer is typically designed to have many discrete reactant layers and a composition that corresponds to the peak enthalpy for a given material system. A thickness of reactive multilayers as small as 1.6 microns has recently been demonstrated for microelectronics joining (Braeuer et al. ECS Transactions, 2012). However, little is known about the minimal multilayer thickness required for ensuring a self-sustained, high temperature synthesis (SHS) reaction.
With this presentation, we describe the behavior of thin reactive Al/Pt multilayers tested as freestanding foils and as adhered films. For multilayers having a total thickness of 1.6 microns, self-sustained, high temperature reactions readily occur when the multilayer is tested as a freestanding foil. When coupled to a semi-infinite substrate, the likelihood of reaction is reduced depending on the multilayer design.
Sandia National Laboratories is a multi-program laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Corporation, for the U.S. Department of Energy’s National Nuclear Security Administration undercontract DE-AC04-94AL85000.