AVS 62nd International Symposium & Exhibition
    Thin Film Wednesday Sessions
       Session TF+AS+BI-WeA

Paper TF+AS+BI-WeA7
Titanium-Niobium Thin Films Deposited by Magnetron Sputtering on AISI 316L Stainless Steel Substrate

Wednesday, October 21, 2015, 4:20 pm, Room 114

Session: Thin Films for Biological and Biomedical Applications
Presenter: Pedro Nascente, Federal University of Sao Carlos, Brazil
Authors: D. Gonzalez, Federal University of Sao Carlos, Brazil
T.C. Niemeyer, Federal University of Sao Carlos, Brazil
C.R.M. Afonso, Federal University of Sao Carlos, Brazil
P.A.P. Nascente, Federal University of Sao Carlos, Brazil
Correspondent: Click to Email

Metallic biomaterials such as AISI 316L stainless steel (SS), chromium-cobalt alloys, titanium and its alloys are commonly used in medical implants due to their interesting mechanical properties and thermal stability. However, 316L SS and Cr-Co alloys have much higher elastic modulus than bone, causing the loss after some years of implantation [1]. The elastic modulus of Ti-based alloys ranges from 55 to 110 GPa, being significantly lower than those for 316L SS (210 GPa) and Cr-Co alloys (240 GPa), making them more suitable for use in dental and orthopedic applications. Also Ti alloys present high strength, low density, high corrosion resistance, and good biocompatibility [1]. Pure Ti has two allotropic forms: hexagonal closest-packed (hcp), known as α phase, and body centered cubic (bcc), known as β phase, structures. Studies have shown that the addition of alloying β-stabilizing elements such as V, Mo, Nb, Zr, Mo, and Ta causes the decreasing of the modulus of elasticity of the β-Ti alloys without compromising the strength [1]. In this study, thin films of Ti-Nb alloys were deposited on AISI 316L stainless steel substrate by magnetron sputtering, and the structure, morphology, and composition of the films were analyzed by means of X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM). Thin films of three compositions were produced: Ti85Nb15 (Ti-26wt% Nb), Ti80Nb20 (Ti-33wt% Nb), and Ti70Nb30 (Ti-45wt% Nb). Structural characterization by XRD indicated that only the β phase was present in the thin films. XPS analysis showed a predominance of oxidized Ti and Nb on the film surfaces. TEM analyses were carried out in the following image modes: bright field (BF) images, selected area diffraction (SAD), scanning mode (STEM) BF and in annular dark field (ADF), and X-ray mapping using energy dispersive spectroscopy (EDS). For the Ti80Nb20 alloy film, TEM analysis showed columnar grains (~100 nm width) of -Ti phase, with a Nb-rich transition layer ranging from finer grains (in contact with SS substrate) to a coarser columnar grains. For the Ti75Nb25 alloy film, TEM analysis showed columnar grains (~50 nm width) of β-Ti phase, with a transition layer away from the SS substrate.

Acknowledgements: A.L. Gobbi, C.A. Silva, S.R. Araujo, and J. Bettini from the Brazilian Nanotechnology National Laboratory, for their assistance in the growth and characterization of the thin films; and CNPq and CNPEM ( Brazil ), for support.

[1] M. Geetha et al., Prog. Mater. Sci. 54 (2009) 397-425.