| AVS 62nd International Symposium & Exhibition | |
| Advanced Surface Engineering | Tuesday Sessions |
| Session SE-TuP |
| Session: | Advanced Surface Engineering Poster Session |
| Presenter: | ShangLun Liu, National Taipei University of Technology, Taiwan, Republic of China |
| Authors: | W.C. Say, National Taipei University of Technology, Taiwan, Republic of China S.L. Liu, National Taipei University of Technology, Taiwan, Republic of China J.H. Hsieh, Ming Chi University of Technology, Taiwan, Republic of China |
| Correspondent: | Click to Email |
TaN thin film coatings are known to have good mechanical properties, impact toughness, as well as good biocompactibility. However, the friction coefficient of these films is sometimes too high, or the hemocompatibility is poor. The purpose of this study is to reduce the friction coefficient and lower the surface energy of TaN coating by introducing CFx into/onto the nitride coatings. CFx–doped TaN films, with and without CFx top layer, were deposited on silicon and tool steel substrates by magnetron sputtering. During the deposition process, C2F6 gas with various flow rates was added. During the deposition of 30 nm CFx top layer on some samples, the power to Ta target was shut off. After deposition, these films were then characterized using XRD, XPS, FTIR, FESEM, as well as a tribometer. The tribo-tests were carried out with and without argon flow. Surface energies of the films were also analyzed with contact angle measurement system. According to structural analysis, TaN phase would transform to Ta(FCN) with the increase of the fluoride gas flow rate, which would cause the decrease of friction coefficient and surface energy. According to the results obtained from tribotesting, it is found the increase of CFx would reduce the effects of moisture and oxygen on friction coefficient. The prepared films may have good hemocompatibility and wear-resistance.