AVS 62nd International Symposium & Exhibition
    Advanced Surface Engineering Monday Sessions
       Session SE+EM+EN-MoA

Paper SE+EM+EN-MoA1
Properties of Zinc Oxide Thin Films Grown on Silicon Wafers by Pulsed Laser Deposition

Monday, October 19, 2015, 2:20 pm, Room 212A

Session: Thin Film Technologies for Energy Storage, Conversion and Harvesting
Presenter: Yilu Li, University of Missouri-Kansas City
Authors: Y.L. Li, University of Missouri-Kansas City
J.W. Wrobel, University of Missouri-Kansas City
M.K. Michael, University of Missouri-Kansas City
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Pulsed ultraviolet light from a XeF excimer laser was used to grow thin films of zinc oxide on (111) p‑type silicon wafers within a versatile high vacuum laser deposition system. Pressure, target temperature and distance from the target to the substrate can be adjusted in the system. Scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction spectroscopy and ellipsometry had been used to analyze the structures and properties of ZnO thin film products.