AVS 62nd International Symposium & Exhibition
    Nanometer-scale Science and Technology Tuesday Sessions
       Session NS-TuP

Paper NS-TuP17
Nichrome Nano-Pillars formed by using Plasma-Assisted GLAD

Tuesday, October 20, 2015, 6:30 pm, Room Hall 3

Session: Nanometer-scale Science and Technology Poster Session
Presenter: Dean Walters, Argonne National Laboratory
Correspondent: Click to Email

Glancing angle deposition has already made a place for itself by being a simple process for making 1-D nano-structures such as rods and pillars. Since the structures are formed as an array built up on a substrate they can be directly applied to applications such as battery anodes, electron emitters, and gas sensors. Why this technique is applicable to a variety of metals and compounds this study focuses on Nichrome A which is an alloy of 80% nickel and 20% chromium which has useful deposition characteristics at room temperature.

The resulting structures that are made by using magnetron sputtering with the addition of plasma assistance will be presented. The purpose of the plasma assistance will be to assess its ability to alter the surface migration of adatoms with the goal of changing the width of the pillar by a means other than temperature. SEM and other results comparing nano-pillars made with and without plasma assistance will be presented.