AVS 62nd International Symposium & Exhibition
    MEMS and NEMS Wednesday Sessions
       Session MN+AM-WeM

Invited Paper MN+AM-WeM10
Roll to Roll Processes at the University of Michigan: Continuous Patterning, Flexible OPVs, and Growth of Carbon Nanomaterials

Wednesday, October 21, 2015, 11:00 am, Room 211A

Session: Emerging Materials & Fabrication Technologies toward Scalable & Additive Nanomanufacturing I
Presenter: Jay Guo, University of Michigan, Ann Arbor
Correspondent: Click to Email
Roll to roll fabrication is regarded as a high-throughput and cost-effective method for future manufacturing of flexible electronics, large area photonic elements and functional surfaces for a variety of applications. This talk will discuss a few examples of roll to roll processes developed at the University of Michigan. First, roll-based patterning processes will be introduced. These include roll to roll nanoimprint lithography (R2RNIL) based on mechanical deformation of polymers and capable of tens of nm resolution, photo-roller-lithography (PRL) by using flexible photomasks to pattern sub-micron and larger features continuously on a moving web. These techniques can be used in many applications, such as metal wire grid based transparent conductors. Next, fabrication of organic optoelectronics OLED and OPV by roll to roll coating processes such as blade coating, blade-slit coating will be discussed. The coating process should be selected properly by considering the thickness requirement for each active layers in the devices. Finally I will report some progress made by the UM team in the Scalable NanoManufacturing program in the roll based continuous growth of carbon nanotubes and graphene.