AVS 62nd International Symposium & Exhibition
    Electronic Materials and Processing Monday Sessions
       Session EM+AS+SS-MoM

Paper EM+AS+SS-MoM10
Metal-Insulator-Insulator-Metal Diodes for Rectenna Applications

Monday, October 19, 2015, 11:20 am, Room 211A

Session: Rectenna Solar Cells, MIM Diodes, and Oxide Interfaces
Presenter: Shijia Lin, Oregon State University
Authors: S. Lin, Oregon State University
N. Murari, Oregon State University
J.F. Conley, Jr., Oregon State University
Correspondent: Click to Email

A metal-insulator-metal (MIM) tunnel diode has a capacitor-like structure with a thin insulating layer sandwiched by two metals. Because of their potential for femtosecond-fast transport when dominated by tunnel transport, MIMs are of interest for rectenna based solar cells, hot electron transistors, and IR detectors. The common strategy to achieving rectification in MIM devices relies on the use of dissimilar work function metal electrodes to produce an asymmetric electron tunneling barrier with polarity dependent tunneling probability. The performance of single layer MIM devices is limited by the workfuction difference that can be achieved between the electrodes and the metal-insulator band offsets. Small electron affinity oxides are limited by high VON. Large electron affinity dielectrics have small VON, but tend to have limited asymmetry due to thermal emission dominated conduction. An alternative approach to controlling asymmetry is to use nanolaminate pairs of insulators with different bandgaps and band offsets to produce asymmetric tunnel barrier metal-insulator-insulator-metal (MIIM) diodes. Asymmetry in MIIM devices may be enhanced by step tunneling1 or defect enhanced direct tunneling.2

In this work, we investigate asymmetry in HfO2/ Nb2O5 bilayer insulator MIIM diodes. HfO2 and Nb2O5 were deposited via atomic layer deposition (ALD) using tetrakis (ethylmethylamino) hafnium (TDMAHf) and niobium ethoxide metal precursors, respectively with H2O as the oxidant. Nanolaminate films were deposited at a chamber temperature of 250°C in one continuous run without breaking vacuum. Sputtered TaN or amorphous metals were used as the bottom electrode and evaporated Al dots were used as a top electrode. MIIM I-V asymmetry and non-linearity are shown to be a function of stack thickness, relative layer thickness, and insulator layer position with respect to the electrodes. Overall, bilayer insulators are shown to be an effective method of enhancing the performance of MIIM tunnel diodes.

1. N. Alimardani and J.F. Conley Jr, Appl. Phys. Lett. 102, 143501 (2013).

2. N. Alimardani and J.F. Conley, Jr., Appl. Phys. Lett. 105, 082902 (2014).