AVS 62nd International Symposium & Exhibition
    Electronic Materials and Processing Friday Sessions
       Session EM+AS+EN+NS-FrM

Paper EM+AS+EN+NS-FrM7
A New Surfactant for Directed Deposition of Carbon Nanomaterials

Friday, October 23, 2015, 10:20 am, Room 211C

Session: Nanoparticles for Electronics and Photonics
Presenter: Hanna Nilsson, University of Maryland
Authors: HM. Nilsson, University of Maryland
L. de Knoop, Chalmers University
J. Ticey, University of Maryland
B. Meany, University of Maryland
Y. Wang, University of Maryland
E. Olsson, Chalmers University
J. Cumings, University of Maryland
Correspondent: Click to Email

We show the results of using a new surfactant, ammonium laurate (AL), to suspend and deposit carbon nanostructures. In a recent publication1, we show that multi-walled carbon nanotubes (MWCNTs) can be suspended in AL with much better shelf stability as compared with the common surfactant sodium dodecyl sulfate (SDS). AL differs from SDS only by the choice of ionic species, but the deposition process with AL is more reliable and cleaner than with SDS. We use a process of producing a charged self-assembled monolayer on the substrate and then exposing the substrates to the aqueous surfactant solution of MWCNTs to achieve directed deposition of clean individual MWCNTs, which can then be used for fabrication of individual nanotube devices. In addition to these results, we show results for single-walled carbon nanotubes (SWCNTs) in AL, which show that nanotubes deposited from AL have lower electrical contact resistance as compared to those deposited from SDS. Photoluminescence results also show that SWCNTs with specific chirality are preferentially suspended in AL, which may present a separation and purification pathway. We will also present extensions of the work to single and few layer graphene sheets, where AL can be used to make clean depositions from aqueous solution onto sensitive substrates.

(1) Nilsson, H. M.; Meany, B.; Ticey, J.; Sun, C.-F.; Wang, Y.; Cumings, J. Ammonium Laurate Surfactant for Cleaner Deposition of Carbon Nanotubes. Langmuir 2015, 31, 6948-6955.