| AVS 62nd International Symposium & Exhibition | |
| Spectroscopic Ellipsometry Focus Topic | Thursday Sessions |
| Session EL+AS+BI+EM-ThA |
| Session: | Optical Characterization of Nanostructures and Metamaterials |
| Presenter: | David Allred, Brigham Young University |
| Authors: | D.D. Allred, Brigham Young University R.S. Turley, Brigham Young University R.T. Perkins, Utah Valley University |
| Correspondent: | Click to Email |
We have used variable-angle, spectroscopic ellipsometry to monitor secular changes in multilayers consisting of chemically active thin films, such as aluminum, deposited on dielectric-coated silicon wafers and protected by various vacuum-applied barrier layers. Ultrathin barrier layers included polymers such as parylene and rarely, sputtered inorganic films, such as silicon. Applications include the measurements of the oxidation of evaporated aluminum for use as a mirror in the VUV (vacuum ultraviolet) and the determination of the optical constants of materials such as Y2O3 potentially useful in VUV and XUV (extreme ultraviolet) optics.