| AVS 62nd International Symposium & Exhibition | |
| Applied Surface Science | Thursday Sessions |
| Session AS-ThP |
| Session: | Applied Surface Science Poster Session |
| Presenter: | Adam Bushell, Thermo Fisher Scientific, UK |
| Authors: | A. Bushell, Thermo Fisher Scientific, UK R. Simpson, University of Surrey, UK C.J. Stephens, Thermo Fisher Scientific, UK C. Deeks, Thermo Fisher Scientific, UK T.S. Nunney, Thermo Fisher Scientific, UK J.P.W. Treacy, Thermo Fisher Scientific, UK |
| Correspondent: | Click to Email |
The use of noble gas ions for sputter cleaning and profiling materials in X-ray Photoelectron Spectroscopy (XPS) analyses is well established. Monatomic ions are generally used while analysing hard inorganic materials, providing efficient cleaning and a good sputter rate while profiling. More recently, argon ion clusters have been found to be very effective at cleaning and profiling organic materials. Cluster ion sputtering of these materials is suitable for cleaning the surface without inducing chemical modification, but it also has potential for preparing surfaces for analysis by techniques other than XPS.
In this presentation we will show the results of an investigation into using a range of cluster energies and sizes not only for XPS, but how they can be used for sample preparation in EBSD. We will illustrate the potential level of successful EBSD analysis that can be achieved when the appropriate etching criteria are used on a sample.