AVS 62nd International Symposium & Exhibition
    2D Materials Focus Topic Tuesday Sessions
       Session 2D+EM+NS+SS+TF-TuM

Paper 2D+EM+NS+SS+TF-TuM10
Systematic Hydrogen Intercalation of Epitaxial Graphene for THz Plasmonics

Tuesday, October 20, 2015, 11:00 am, Room 212C

Session: Optical and Optoelectronic Properties of 2D Materials
Presenter: Kevin Daniels, National Research Council postdoc working at NRL
Authors: K.M. Daniels, National Research Council postdoc working at NRL
A. Boyd, American Society for Engineering Education postdoc working at NRL
R.L. Myers-Ward, Naval Research Laboratory
D.K. Gaskill, Naval Research Laboratory
Correspondent: Click to Email

Epitaxial growth of graphene via sublimation of silicon and graphitization of carbon atoms from silicon carbide (SiC) is ideal for large scale manufacturing of plasmonic devices but due to partially covalent bonding between the SiC (0001) substrate and the first carbon layer (6√3 buffer layer), the high room temperature mobility necessary for THz plasmonics is reduced significantly compared to exfoliated graphene. The objective of this work is to improve THz response of EG by increasing the mobility and carrier concentration of graphene through hydrogen intercalation where the Si atoms covalently bound to the buffer layer are satisfied by hydrogen atoms and create quasi free standing graphene.

Epitaxial graphene was grown from 6H-SiC (0001) in an Aixtron/Epigress VP508 horizontal hot-wall reactor, etching in H2 during temperature ramp to 1570°C and growing graphene in Ar ambient at 1580°C. H-intercalation of EG was carried out in the same reactor at 1050°C with a flow of 80slm of H2 and chamber pressure of 900mbar for 15-75 minutes. Morphology of the quasi-free standing graphene was observed by AFM and SEM. Raman spectroscopy using a 532nm laser (9.6mW) and spot size of 0.3μm were used to take 80x10μm maps of each sample where release of the buffer layer is observed, with broadening of the 2D peak full-width-half-max (FWHM) before and after H-intercalation is observed on the graphene terraces and step edges. Number of monolayers before and after H-intercalation was determined by XPS.

From SEM, AFM, Raman and Hall we observe changes in degree of hydrogen intercalation with respect to time. Large areas of partially intercalated EG is observed at 15 minutes which confirmed by a mix of charge carriers and reduced carrier mobility at ~250cm2/Vs. At 30 minutes some graphene terraces remain coupled to the SiC substrate with carrier mobility ~2250cm2/Vs. From 45, 60 and 75 minutes the buffer layer becomes mostly quasi free standing with small spots possibly coupled to the substrate as observed in the SEM with mobilities of ~3900, ~4000 and ~3700cm2/Vs respectively. Measurements of the resulting THz transmission spectra are currently underway to determine if the increase in mobility and carrier concentration results in narrower THz response.