AVS 62nd International Symposium & Exhibition
    2D Materials Focus Topic Thursday Sessions
       Session 2D+EM+MG+NS+SS+TF-ThA

Paper 2D+EM+MG+NS+SS+TF-ThA6
Direct Growth of Graphene/h-BN(0001) Multilayer Heterostructures for Novel Device Applications

Thursday, October 22, 2015, 4:00 pm, Room 212C

Session: Heterostructures of 2D Materials
Presenter: Jeffry Kelber, University of North Texas
Authors: S. Driver, University of North Texas
D. Beatty, University of North Texas
B. Olanipekun, University of North Texas
S. Reid, University of North Texas
A. Kelber, University of North Texas
Correspondent: Click to Email

We report the direct layer-by-layer growth of h-BN(0001) multilayers on Co(0001) by atomic layer epitaxy (ALE), and the direct growth of graphene multilayers on h-BN(0001) by molecular beam epitaxy (MBE). For the first time, this allows the growth of graphene/BN heterostructures with graphene and BN thicknesses controlled with atomic precision, and with all graphene and BN layers in azimuthal registry. Such control is a prerequisite for many proposed spintronic and electronic applications that emphasize charge or spin transport perpendicularly through the heterojunction. Further, the growth by direct, scalable methods without physical transfer, is essential for industrial development of such devices. h-BN(0001) multilayers have been deposited on Co(0001)/Al2O3(0001), using a BCl3/NH3 ALE process at 600 K. X-ray photoelectron spectroscopy (XPS) indicates B:N atomic ratios of 1:1 with negligible Cl contamination or reaction with the metallic substrate. Low energy electron diffraction (LEED) data indicate BN domain sizes of ~ 300 A or greater, with the lattice in registry with that of the Co(0001) substrate. LEED data also indicate BN domains larger than those of the Co substrate, suggesting BN overgrowth of Co domain boundaries. The XPS-derived average BN film thickness scales linearly with the number of BCl3/NH3 cycles, and the lack of Co oxidation after ambient exposure of a BN bilayer indicates that these films are macroscopically continuous over the 1 cm x 1 cm sample size. Graphene formation on h-BN(0001) was achieved using MBE with a graphite rod source, with deposition carried out at 800 K. LEED data show the expected 6-fold LEED pattern in exact registry with that of the h-BN(0001)/Co(0001) substrate. XPS C 1s spectra indicate a C 1s binding energy near 284.5 eV and with the expected pi-to-pi* transition. A heterojunction consisting of ~ 3 monolayers (ML) graphene/3 ML h-BN on Co(0001) proved stable in vacuum to at least 1000 K, indicating the adaptability of this growth process to a variety of industrial applications. Other recent results indicate the adaptability of this process to other substrates, such as Ru(0001) or CoSi2(111). These developments make possible a variety of spin filters, spin valves, and tunneling transistors proposed on the basis of close BN/graphene lattice matching, but not readily achievable with physically transferred films.

Acknowledgements: This work was supported by CSPIN, a MARCO/DARPA STARnet Center, under tasks 2381.001

and 2381.003, and by a UNT ROP grant. Peter Dowben and Jian-Ping Wang are acknowledged for stimulating and informative discussions.