AVS 62nd International Symposium & Exhibition
    2D Materials Focus Topic Tuesday Sessions
       Session 2D+EM+MC+MI+NS+SP+SS+TF-TuA

Paper 2D+EM+MC+MI+NS+SP+SS+TF-TuA3
Patterning Hydrogenated Graphene via Electron Beam Irradiation

Tuesday, October 20, 2015, 3:00 pm, Room 212C

Session: Electronic and Magnetic Properties of 2D Materials
Presenter: Woo-Kyung Lee, Naval Research Laboratory
Authors: W.K. Lee, Naval Research Laboratory
K.E. Whitener, Naval Research Laboratory
J.T. Robinson, Naval Research Laboratory
P.E. Sheehan, Naval Research Laboratory
Correspondent: Click to Email

We demonstrate that electron-beam irradiation selectively removes hydrogen atoms from hydrogenated graphene (HG) prepared by the Birch reduction.1 Hydrogen removal can pattern the surface with two different functionalities. First, we show that partially-hydrogenated graphene (Phg) on a SiO2 substrate is ferromagnetic, and that the local magnetic strength can be tuned using e-beam irradiation. An e-beam lithography system enables us to modulate or eliminate the permanent magnetization over a large area to produce a patterned magnetic array. Secondly, since removal of the hydrogens converts the highly electrically insulating HG back into conductive graphene, we can write chemically isolated, dehydrogenated graphene nanoribbons (GNR) as narrow as 100 nm. These GNRs have a low sheet resistance (≥ 31.5 Kω/□), only 10x that of the pristine graphene, and their Dirac points before and after e-beam irradiation appear at comparable gate voltages.

1. W.K. Lee et al., Advanced Materials, 27, 1774 (2015).