| 2:00pm |
TF+PS-MoA1
Broadband Sum-frequency Generation: Studying the Initial Growth of ALD Al2O3 by Nonlinear Surface Vibrational Spectroscopy
Vincent Vandalon, R.H.E.C. Bosch, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
| 2:20pm |
TF+PS-MoA2
In Situ FTIR Analysis of Reaction Mechanisms between Trimethylaluminum and Carbonyl-Containing Polymers During ALD
Philip Williams, E.C. Dandley, A. Brozena, C. Needham, C.J. Oldham, G.N. Parsons, North Carolina State University |
| 2:40pm |
TF+PS-MoA3
Time-resolved FT-IR Spectroscopy during ALD using La(iPrCp)3 and H2O
Brent Sperling, J.E. Maslar, W.A. Kimes, NIST |
| 3:00pm |
TF+PS-MoA4
Surface Reactions and Interface Evolution during the ALD of HfO2 on GaAs Surfaces Studied by In Situ ATR-FTIR
Liwang Ye, T. Gougousi, University of Maryland, Baltimore County |
| 3:40pm |
TF+PS-MoA6 Invited Paper
Precursor Design: Controlling Melting Point, Volatility, Reactivity and Other Important Characteristics of CVD and ALD Precursors
Seán Barry, Carleton University, Canada |
| 4:20pm |
TF+PS-MoA8
Characterizing Vapor Delivery of μ2-η2-(tBu-Acetylene)Dicobalthexacarbonyl (CCTBA) for Deposition Processes
James Maslar, W.A. Kimes, B.A. Sperling, National Institute of Standards and Technology (NIST), R. Kanjolia, SAFC Hitech |
| 4:40pm |
TF+PS-MoA9
Effect of Precursor on Coating Uniformity in Mesoporous Metal Oxide Films during Steady and Hold-Step ALD Processes
Berç Kalanyan, M.D. Losego, G.N. Parsons, North Carolina State University |
| 5:00pm |
TF+PS-MoA10
Study of the Growth of Zinc Tin Oxide As Model System for Ternary Metal Oxide Atomic Layer Deposition
Adriaan Mackus, R.W. Johnson, W.-H. Kim, S.F. Bent, Stanford University |