AVS 61st International Symposium & Exhibition | |
Novel Trends in Synchrotron and FEL-Based Analysis Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | SA-MoM1 Invited Paper Looking Into Buried Interfaces with Soft/hard X-Ray Photoemission and Standing-Wave Excitation Charles Fadley, University of California, Davis |
9:00am | SA-MoM3 Hard X-ray Photoelectron Spectra (HXPES) of Bulk Non-Conducting Silicate Glasses Yongfeng Hu, Q.F. Xiao, X.Y. Cui, D. Wang, Canadian Light Source, Canada, G.M. Bancroft, H.W. Nesbitt, M. Biesinger, University of Western Ontario, Canada |
9:20am | SA-MoM4 In Situ Study of Plasma Assisted Atomic Layer Epitaxy of III-N Semiconductors Using Synchrotron X-ray Methods N. Nepal, Naval Research Laboratory, M.G. Erdem, Boston University, S.D. Johnson, V.R. Anderson, Naval Research Laboratory, A. DeMasi, K.F. Ludwig, Boston University, Charles Eddy, Jr., Naval Research Laboratory |
9:40am | SA-MoM5 Invited Paper Application of Synchrotron Radiation Based Hard X-ray Photoelectron Spectroscopy (HAXPES) to Characterise Semiconductor Device Structures Greg Hughes, L. Walsh, Dublin City University, Ireland, J.C. Woicik, National Institute of Standards and Technology (NIST), P.K. Hurley, Tyndall National Institute, Ireland |
10:40am | SA-MoM8 Invited Paper Correlative Probing of the Surface Chemistry and Electron Transport of Nanodevices in Operando Mode using Scanning Photoelectron Emission Microscopy Andrei Kolmakov, National Institute of Standards and Technology (NIST) |
11:20am | SA-MoM10 Invited Paper A NEXAFS Spectromicroscope for Structural and Chemical Imaging Analysis Conan Weiland, Synchrotron Research, Inc., Z. Fu, C. Jaye, D.A. Fischer, National Institute of Standards and Technology, K. Scammon, University of Central Florida, P.E. Sobol, E.L. Principe, Synchrotron Research, Inc. |