AVS 61st International Symposium & Exhibition | |
Spectroscopic Ellipsometry Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:20pm | EL+AS+EM+MC+SS-ThA1 Invited Paper The Optical Properties of Metallic Nanostructures Bruno Gompf, Universität Stuttgart, Germany |
3:00pm | EL+AS+EM+MC+SS-ThA3 Mueller Matrix Ellipsometry As a Powerful Tool for Nanoimprinted Grating Structure Metrology Xiuguo Chen, C.W. Zhang, S.Y. Liu, Huazhong University of Science and Technology, China |
3:20pm | EL+AS+EM+MC+SS-ThA4 Vector Magneto-Optical Generalized Ellipsometry on Sculptured Thin Films with Forward Calculated Uniaxial Response Simulation Chad Briley, T. Hofmann, University of Nebraska-Lincoln, D. Schmidt, National University of Singapore, E. Schubert, M. Schubert, University of Nebraska-Lincoln |
4:00pm | EL+AS+EM+MC+SS-ThA6 In Situ Generalized Ellipsometry Characterization of Silicon Nanostructures during Lithium-ion Intercalation Derek Sekora, R.Y. Lai, T. Hofmann, M. Schubert, E. Schubert, University of Nebraska-Lincoln |
4:20pm | EL+AS+EM+MC+SS-ThA7 Characterization of SiO2 Nanoparticle Layers on a Glass Substrate by Spectroscopic Imaging Ellipsometry and AFM Peter H. Thiesen, Accurion GmbH, Germany, G. Hearn, Accurion Inc., C. Röling, Accurion GmbH, Germany |
5:00pm | EL+AS+EM+MC+SS-ThA9 Dielectric Tensor Model for Inter Landau-level Transitions in Highly Oriented Pyrolytic Graphite and Epitaxial Graphene – Symmetry Properties, Energy Conservation and Plasma Coupling Philipp Kühne, Linköping University, Sweden, T. Hofmann, M. Schubert, University of Nebraska-Lincoln, C.M. Herzinger, J.A. Woollam Co., Inc., V. Darakchieva, Linköping University, Sweden |
5:20pm | EL+AS+EM+MC+SS-ThA10 Characterization of Exfoliated 2D Nano Materials with Imaging Spectroscopic Ellipsometry P.H. Thiesen, Accurion GmbH, Germany, Greg Hearn, Accurion Inc., B. Miller, Technische Universität München, Germany, C. Röling, Accurion GmbH, Germany, U. Wurstbauer, Columbia University, E. Parzinger, A.W. Holleitner, U. Wurstbauer, Technische Universität München, Germany |