| AVS 61st International Symposium & Exhibition | |
| Thin Film | Tuesday Sessions |
| Session TF+PS-TuM |
| Session: | ALD for Emerging Applications |
| Presenter: | Michael Stanford, University of Tennessee |
| Authors: | M.G. Stanford, University of Tennessee B.B. Lewis, University of Tennessee J.H. Noh, University of Tennessee H. Plank, Graz University of Technology, Austria J. Fowlkes, Oak Ridge National Laboratory N.A. Roberts, Utah State University P.D. Rack, University of Tennessee |
| Correspondent: | Click to Email |
Electron beam induced deposition (EBID) is a direct-write process which can be used to selectively deposit material with nanoscale resolution. EBID utilizes a scanning focused electron beam to dissociate adsorbed precursor molecules which subsequently condense onto the substrate. One of the major limitations of the EBID process is low material purity resulting from incomplete by-product removal of the typically organometallic precursor. Therefore, the development of EBID purification strategies for enhanced materials functionality is a grand challenge for wider application of this synthesis technique. While recently EBID deposits have been used as selective atomic layer deposition catalyst, here we demonstrate an in-situ ALD-like process driven by electron and laser-induced thermal half reactions. We have developed an O2-assisted laser anneal process to enhance the purity of patterns deposited using MeCpPtIVMe3 precursor gas. Additionally, we have demonstrated a laser assisted electron-beam-induced-deposition (LAEBID) process as an effective method to provide in-situ purification during deposition. The synchronized process is initiated by an approximately monolayer EBID cycle followed by a laser pulse which thermally desorbs by-products of the condensed phase. The process is repeated until the desired shape and size is achieved. The addition of a reactive O2 gas and a synchronized electron and laser pulse begins to look a lot like a nanoscale atomic layer deposition process (ALD), however the half reactions are electron and thermally stimulated, respectively. We will demonstrate how factors such as laser pulse width, laser duty cycle, EBID beam current, and EBID dwell time have significant effects on the laser anneal and LAEBID processes. Importantly, the carbon reduction and apparent densification lead to higher resolution relative to standard EBID.