AVS 61st International Symposium & Exhibition | |
Thin Film | Monday Sessions |
Session TF+PS-MoM |
Session: | Atmospheric, Roll-to-Roll and other Manufacturing Advances in ALD |
Presenter: | Kashish Sharma, University of Colorado at Boulder |
Authors: | K. Sharma, University of Colorado at Boulder R.B. Hall, University of Colorado at Boulder S.M. George, University of Colorado at Boulder |
Correspondent: | Click to Email |
Li-ion batteries (LIBs) have a capacity that typically decays versus number of charge-discharge cycles. Surface coatings on LIB electrodes fabricated using atomic layer deposition (ALD) can dramatically improve the capacity stability. The commercialization of these ALD coatings requires the ability to perform ALD on porous battery electrodes on flexible metal webs. In this work, a new spatial ALD (S-ALD) reactor is developed that is based on a modular rotating cylinder design. The outer cylinder remains fixed and contains a series of slits. The slits can accept a wide range of modules that attach from the outside and accommodate precursor dosing, purging or pumping. The inner cylinder rotates (0-200 RPM) and passes underneath the various slits that are spatially separated. This new S-ALD reactor has been characterized using trimethyl aluminum (TMA) and ozone to grow Al2O3 ALD films at 40°C on metallized PET substrates. Spectroscopic ellipsometry measurements obtained Al2O3 ALD growth rates of 0.6 -1.1 Å/cycle depending on the O2 pressure used to prepare the ozone. The Al2O3 ALD growth rate was also constant with changing rotation speeds from 60 to 150 RPM. Future experiments will deposit Al2O3 ALD films on porous electrodes on flexible metal webs. For these depositions, a “push-pull” design will be utilized where the pressure of the precursor dose will “push” the precursor and carrier gas into the evacuated porous electrode. The reaction products and carrier gas will then be “pulled” from the porous electrode by vacuum pumping. This new spatial ALD reactor has the potential to deposit uniform and conformal thin films on large area and flexible porous substrates at high deposition rates.