| AVS 61st International Symposium & Exhibition | |
| Surface Science | Friday Sessions |
| Session SS+EM-FrM |
| Session: | Semiconductor Surfaces and Interfaces 2 |
| Presenter: | Andrew Davis, CAMECA Instruments Inc |
| Authors: | E. Martinez, CEA, LETI, MINATEC Campus, France C. Trouiller, STMicroelectronics, France M.P. Moret, CAMECA, France N. Morel, CAMECA, France A. Davis, CAMECA Instruments Inc P. Caubet, STMicroelectronics, France F. Bertin, CEA, LETI, MINATEC Campus, France |
| Correspondent: | Click to Email |
We report about accurate monitoring of ultra-low La doses inserted in advanced high-k/metal gate stacks for threshold voltage tuning purposes. Three characterization techniques are implemented for precise and reproducible lanthanum quantification. LEXES (Low energy Electron X-ray Emission Spectrometry) capabilities are highlighted in terms of sensitivity and accuracy thanks to a comparison with reference results obtained by Rutherford Backscattering Spectrometry (RBS). The capabilities of state-of-the-art Auger nanoprobes for depth profiling in the sub-nanometer range are also illustrated.