| AVS 61st International Symposium & Exhibition | |
| Scanning Probe Microscopy Focus Topic | Wednesday Sessions |
| Session SP+AS+BI+NS+SS-WeA |
| Session: | Advances in Scanning Probe Microscopy |
| Presenter: | Ndubuisi Orji, National Institute of Standards and Technology (NIST) |
| Authors: | N.G. Orji, National Institute of Standards and Technology (NIST) S. Gonda, AIST, Japan R.G. Dixson, National Institute of Standards and Technology (NIST) |
| Correspondent: | Click to Email |
Although scanning probe microscopes are used in a wide variety of nanoscale measurements, the issue of instrument characterization, accuracy and calibration, continue to be a limiting factor in interpreting the resulting data. In order to accurately characterize dimensional linearity and accuracy at the sub-nanometer range, samples and robust analysis techniques suited to measurements at this range should be used.
Using Al203 surfaces on the c(0001), a(110), and r(102) planes, and robust analyses techniques, we evaluate stepped surfaces for linearity characterization at the nanoscale. Measurements were performed using a traceable atomic force microscope (T-AFM) with displacement interferometry in all three axes. The T-AFM, which has a metrology scanning stage monitored in six axes, is housed in a mini environment with a long term temperature range of less than 2 mK, and serves as a stable platform to develop calibration standards.
The smallest of the features Al203 c(0001) with a height of 0.22 nm shows a combined uncertainty of 0.01 nm, with a linearity of 0.009%. The intrinsic traceability of the T-AFM (through displacement interferometer to the SI meter) provides additional verification to the size naturally occurring steps of the Al203 and other samples used. The results show that robust and stable linearization and calibration procedures could be developed for sub nanometer SPM characterization with low uncertainty. This will enable and support accurate dimensional characterization of scientifically relevant surfaces.