AVS 61st International Symposium & Exhibition
    Nanometer-scale Science and Technology Monday Sessions
       Session NS+EN-MoA

Paper NS+EN-MoA3
Patterning of Plasmonic Structures for Chiroptical Spectroscopy

Monday, November 10, 2014, 2:40 pm, Room 304

Session: Nanophotonics and Plasmonics 
Presenter: Oded Rabin, University of Maryland, College Park
Authors: O. Rabin, University of Maryland, College Park
A.P. Lawson, University of Maryland, College Park
P.C. McAvoy, University of Maryland, College Park
I.D. Mayergoyz, University of Maryland, College Park
Correspondent: Click to Email
Fabrication of truly chiral nanostructures is a challenging process, often requiring multiple cycles of patterning, deposition and planarization. Planar and three dimensional plasmonic nanostructures were fabricated through focused ion beam (FIB) milling, electron beam lithography (EBL) patterning, and a combination thereof, achieving truly chiral nanoscale patterns in a single deposition step. Using computational modeling tools, the plasmon resonance spectra of the structures were predicted. We have combined our computational results and novel fabrication methods to achieve chiral plasmonic nanostructures with useful resonances in the visible and near infrared ranges of the EM spectrum. These substrates are promising for the selective manipulation of circularly polarized radiation at nanometer length scales.