AVS 61st International Symposium & Exhibition
    Energy Frontiers Focus Topic Wednesday Sessions
       Session EN+AS+EM+SE-WeM

Paper EN+AS+EM+SE-WeM6
Improvement of SnS-based Photovoltaic Devices via Reverse Engineering of the Voc and Study of Optimal n-Type Material

Wednesday, November 12, 2014, 9:40 am, Room 315

Session: Thin Film Photovoltaics
Presenter: Rona Banai, Penn State University
Authors: R.E. Banai, Penn State University
N.J. Tanen, Penn State University
J.J. Cordell, Penn State University
J.R. Nasr, Penn State University
R.E. Urena, Penn State University
H. Lee, Penn State University
J.R.S. Brownson, Penn State University
M.W. Horn, Penn State University
Correspondent: Click to Email

Tin (II) Monosulfide (SnS) has theoretical promise as a new material for thin film photovoltaics (PV). Despite a full decade of rigorous research to develop SnS-based devices, improvement beyond single-digit percent efficiencies seems unattainable. Engineering this material into a usable device is crucial for future development. Our group has been investigating the optical and structural properties of magnetron sputtered SnSx thin films [1,2,3] . This work will investigate the properties that govern open-circuit voltage, including band gap, series resistance, carrier concentration and built-in potential. Some of these parameters are directly related to the junction material paired with SnS. Several partner materials will be presented with p-SnS including, but not limited to highly doped n-ZnO and n-SnS. Current work is underway to produce n-type SnS as well which would have potential to produce a homojunction.

The optoelectronic properties of SnS make it a suitable material for PV. Its high absorption coefficient, greater than 104 cm-1, and band gap near 1.3 eV are well matched with the solar spectrum. SnS also has a carrier concentration greater than 1015 cm-3 and potential to be both n-type and p-type. Our group is able to produce dense SnS thin films with optimal electronic properties. Sputtering the material gives great control over the material properties and recent work optimizing post-deposition heat treatment has shown great promise for improving the material.

Tin sulfide thin films were sputtered on glass and oxidized silicon substrates at varying substrate-to-target distances, substrate temperature, target power, and chamber pressure. The sputter target was a 3” SnS2 with 99.999% purity (LTS Research Laboratories, Inc.). These sulfur-rich samples were then annealed under medium vacuum (<2x10-6 Torr) in the deposition chamber at 400°C to produce a uniform α -SnS, which is most likely to be p-type. Producing n-type SnS is possible via annealing of the films in a methanol/SnCl4 solution. Production of homojunction SnS-based thin film devices is not found in the literature. Our work aims to produce these devices for the first time and compare them to a well-known partner material such as ZnO.

[1]

R. E. Banai, et al., in Proceedings of 2012 38th IEEE Photovoltaics Specialists Conference, Austin, 2012, pp. 164-169.

[2]

R. E. Banai, et al., IEEE Journal of Photovoltaics, vol. 3, no. 3, pp. 1084-1089, 2013.

[3]

R. E. Banai, et al., in Proceedings of 2013 39th IEEE Photovoltaic Specialists Conference, Tampa, 2013, pp. 2562-2566.