AVS 61st International Symposium & Exhibition
    Electronic Materials and Processing Monday Sessions
       Session EM+MI+NS-MoM

Paper EM+MI+NS-MoM10
The Surface Study of Hexagonal LuFeO3 Multiferroic Thin Films

Monday, November 10, 2014, 11:20 am, Room 314

Session: Complex Oxides and Their Interfaces
Presenter: Shi Cao, University of Nebraska-Lincoln
Authors: S. Cao, University of Nebraska-Lincoln
X.S. Xu, University of Nebraska-Lincoln
T. Paudel, University of Nebraska-Lincoln
E.Y. Tsymbal, University of Nebraska-Lincoln
P.A. Dowben, University of Nebraska-Lincoln
Correspondent: Click to Email
The surface properties of hexagonal LuFeO3 thin film have been studied by ultra-high vacuum based characterization technologies such as X-ray/ultra-violet photoemission spectroscopy (XPS/UPS), inverse photoemission spectroscopy (IPES) and XMCD-PEEM. Hexagonal LuFeO3 is a stable multiferroic at room temperature with potential magneto-electric properties. The application of this material in voltage controlled magnetic devices depends very significantly on the interface composition and interface magnetism. The angle resolved XPS shows the possible iron-rich termination and the oxygen deficiency due to the sensitivity of the surface to the of sample preparation methods. The combined UPS and IPES allow us to infer that this multiferroic oxide, LuFeO3, has a band gap about 2.35eV. All these characterizations are consistent with the density function theory calculations of the surface and bulk band structure.