AVS 61st International Symposium & Exhibition
    Spectroscopic Ellipsometry Focus Topic Thursday Sessions
       Session EL-ThP

Paper EL-ThP6
High Speed Spectroscopic Ellipsometry Technique for On-line Monitoring in 600x1200mm Standard Sized Solar Panel Production

Thursday, November 13, 2014, 6:00 pm, Room Hall D

Session: Spectroscopic Ellipsometry Poster Session
Presenter: Miklos Fried, Hungarian Academy of Science, Hungary
Authors: C. Major, Mta Ttk Mfa, Hungary
G. Juhasz, Mta Ttk Mfa, Hungary
P. Petrik, Mta Ttk Mfa, Hungary
ZG. Horvath, MTA Wigner, Hungary
M. Fried, Hungarian Academy of Science, Hungary
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A macro imaging spectroscopic ellipsometer has been developed for high speed mapping of large area multilayer coated substrates. Non-contact or touchless characterization techniques based on spectroscopic ellipsometry (SE) are widely used by the photovoltaic industry for process or quality control in production. The commercialization of thin film photovoltaic (PV) technologies and the related increasing surfaces lead to many key problems such as reduced efficiency caused by multiple non-uniformities of the layers properties over the entire panel resulting from the technological steps of individual layer components. Scanning methods, based on the conventional narrow beam spectroscopic ellipsometry measurements provides high accuracy but suffer from long mapping times as the polarization state of the reflected beam must be detected. Our new instrument provides a line image of SE (wl=350-1000 nm) data with a lateral resolution of ~20 mm, thus SE information of 1800 points can be collected less than 600 sec over a 600 x 1200 mm PV material and it could be several 10 times faster than a conventional scanning method. In this paper the calibration were carried out on SiO2/c-Si structures and test measurements on a-Si films grown on soda lime glass (transparent samples) are presented.