| AVS 61st International Symposium & Exhibition | |
| Applied Surface Science | Thursday Sessions |
| Session AS-ThP |
| Session: | Applied Surface Science Poster Session |
| Presenter: | Simon Hutton, Kratos Analytical Limited, UK |
| Authors: | S.J. Hutton, Kratos Analytical Limited, UK T. Bendikov, Weizmann Institute of Science, Israel W. Boxford, Kratos Analytical Limited, UK SC. Page, Kratos Analytical Limited, UK J.D.P. Counsell, Kratos Analytical Limited, UK |
| Correspondent: | Click to Email |
Thin polymer films are found in an enormous range of devices and have many applications from use in semi-conductors, displays and solar cells to corrosion protection and packaging. New ion sources such as the multi-mode Ar gas cluster ion source (GCIS) have revolutionised the study of such organic thin films by depth profiling with techniques such as X-ray photoelectron spectroscopy (XPS). As reported elsewhere the chemical composition of organic thin films may now be determined as a function of depth by a combination of XPS analysis and etching using massive Ar ions.
In this study we present results from XPS gas cluster depth profiling of multi-layer organometallic thin films. The multi-layer structures are formed by sequential immersion of a pyridine-terminated template layer on silicon or ITO-coated glass substrates.