| AVS 61st International Symposium & Exhibition | |
| Applied Surface Science | Friday Sessions |
| Session AS+MC+SS-FrM |
| Session: | Practical Surface Analysis II |
| Presenter: | Kevin Jones, University of Delaware |
| Authors: | R.L. Opila, University of Delaware K.J. Jones, University of Delaware J. Church, University of Delaware R. Gupta, Air Liquide V. Pallem, Air Liquide B. Lefevre, Air Liquide X. Lin, University of Delaware |
| Correspondent: | Click to Email |
Surface analysts at the University of Delaware have used a variety of surface analytical techniques to analyze films for electronic materials applications. These films were deposited by a variety of technique including plasma enhanced chemical vapor deposition, molecular organic chemical vapor deposition and atomic layer deposition using precursors synthesized at Air Liquide. Methods of analysis include x-ray photoelectron spectroscopy, scanning Auger electron spectroscopy, time-of-flight secondary ion spectrometry, nano-indentation and synchrotron-based hard x-ray analysis. The advantages of each technique for particular analyses will be discussed.