| AVS 60th International Symposium and Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF+EM+NS+SS-ThA1 Comparison of Al2O3 Deposited via Prompt Inorganic Condensation vs. Atomic Layer Deposition S.W. Smith, W. Wang, D.J. Matthews, D.A. Keszler, J.F. Conley, Oregon State University |
| 2:20pm | TF+EM+NS+SS-ThA2 Static Mode CVD at Low Temperatures: Highly Conformal and Smooth Films in Deep Structures A.N. Cloud, J.L. Mallek, K.A. Arpin, P.V. Braun, G.S. Girolami, J.R. Abelson, University of Illinois at Urbana Champaign |
| 2:40pm | TF+EM+NS+SS-ThA3 Invited Paper Growth of Nanocomposite and Epitaxial Nitride and Oxide Thin Films by Magnetron Sputtering for Thermoelectric Applications B. Paul, S. Kerdsongpanya, P. Eklund, Linkoping University, Sweden |
| 3:40pm | TF+EM+NS+SS-ThA6 Atomic Layer Deposition of Pb(ZrxTi1-x)O3 Thin Films D. Chien, T. Kim, J. Choi, J.P. Chang, UCLA |
| 4:20pm | TF+EM+NS+SS-ThA8 Invited Paper Aluminum Nitride Thin Films Deposition, Properties and Applications L. le Brizoual, J. Camus, K. Ait Aissa, Q. Simon, P.Y. Jouan, M.A. Djouadi, Univ. de Nantes - CNRS-IMN, France, Y. Cordier, E. Frayssinet, M. Chmielowska, M. Nemoz, P. Vennéguès, S. Chenot, CRHEA-CNRS, France, N. Defrance, M. Lesecq, P. Altuntas, A. Cutivet, A. Agboton, J.C. De Jaeger, Univ. de Lille - CNRS-IEMN, France |
| 5:00pm | TF+EM+NS+SS-ThA10 Atomic Layer Deposition of Tungsten Nitride Thin Films — Initial Surface Reactions K. Bernal Ramos, The University of Texas at Dallas, R.K. Kanjolia, SAFC Hitech, Y.J. Chabal, The University of Texas at Dallas |
| 5:40pm | TF+EM+NS+SS-ThA12 Metal Oxide Growth, Characterization and Spin Precession Measurement in CVD Graphene A. Matsubayashi, University at Albany-SUNY, J. Abel, Intel Corporation, D. Sinha, J. Lee, V.P. LaBella, University at Albany-SUNY |