| AVS 60th International Symposium and Exhibition | |
| Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | SS+EN-ThM1 Hindering Influence of Oxygen Vacancies for Photoactivity on TiO2(110) I. Lyubinetsky, Z.T. Wang, Pacific Northwest National Laboratory, N.A. Deskins, Worcester Polytechnic Institute, M.A. Henderson, Pacific Northwest National Laboratory |
| 8:20am | SS+EN-ThM2 Anisotropic Photochemical Reactivity of Rutile (110) A. Song, D. Jing, M.A. Hines, Cornell University |
| 9:20am | SS+EN-ThM5 Energy Transfer and Photostimulated Desorption of Atoms and Molecules Co-adsorbed with Oxygen on TiO2(110) Surface N.G. Petrik, G.A. Kimmel, Pacific Northwest National Laboratory |
| 9:40am | SS+EN-ThM6 Adsorption and Photo-induced Decomposition of Formate on Rutile TiO2 (110) A. Mattsson, S. Hu, K. Hermansson, L. Österlund, Uppsala University, Sweden |
| 10:40am | SS+EN-ThM9 TiO2 Nanoparticle Arrays Functionalized with Pt Photodeposition: Studies Using X-ray Spectroscopies under In Situ Heating and Hydrogen Annealing Y. Liu, J. Taing, University of California, Irvine, C.-C. Chen, Argonne National Laboratory, H. Bluhm, Z. Liu, Lawrence Berkeley National Laboratory, M. Veenendaal, Argonne National Laboratory, T. Devereaux, SLAC National Accelerator Laboratory, J.C. Hemminger, University of California, Irvine |
| 11:00am | SS+EN-ThM10 Carrier Dynamics on Oxide Surfaces Studied by Time-resolved Soft X-ray Photoelectron Spectroscopy S. Yamamoto, R. Yukawa, The University of Tokyo, Japan, M. Emori, Sophia University, Japan, K. Ozawa, Tokyo Institute of Technology, Japan, M. Ogawa, K. Fujikawa, Sh. Yamamoto, R. Hobara, I. Matsuda, The University of Tokyo, Japan |
| 11:20am | SS+EN-ThM11 Atomic Scale Photochemistry with STM A.X. Yu, S.W. Li, G. Czap, Y.N. Zhang, H.Y. He, R.Q. Wu, W. Ho, University of California, Irvine |
| 11:40am | SS+EN-ThM12 Atomic Structure and Catalytic Activity of Size-Selected MoS2 Nanoclusters for Water Splitting R.E. Palmer, M. Cuddy, K. Arkill, Z.W. Wang, N.V. Rees, University of Birmingham, UK |