| AVS 60th International Symposium and Exhibition | |
| Thin Film | Tuesday Sessions |
| Session TF-TuA |
| Session: | High Throughput ALD |
| Presenter: | D. Muñoz-Rojas, University of Cambridge, UK |
| Authors: | D. Muñoz-Rojas, University of Cambridge, UK G. Ercolano, University of Cambridge, UK A.T. Marin, University of Cambridge, UK C.T. Armstrong, University of Cambridge, UK R.L.Z. Hoye, University of Cambridge, UK K.P. Musselman, University of Cambridge, UK J.L. MacManus-Driscoll, University of Cambridge, UK |
| Correspondent: | Click to Email |
A key factor for the success of new generation PV technologies is the ability to design low-cost, low-temperature, scalable and roll-to-roll compatible fabrication methods. In recent years progressive development of batch type vacuum-free ALD technologies has taken place with novel systems capable of working in the open atmosphere being presented. The key to atmospheric/spatial ALD (AALD/SALD) is that precursors are separated in space rather than in time (as opposed to conventional ALD, which has a sequence of pulse-purge steps), thus allowing orders of magnitude faster deposition rates and low precursor wastage, while keeping the advantages of conventional ALD. We have developed and optimised an AALD system for the deposition of solar cell components and which is compatible with roll-to-roll processing. We will illustrate its potential with several examples, namely, ultrafast deposition of high quality amorphous TiO2 and ZnO blocking layers for inverted bulk heterojunction solar cells; low temperature deposition of high conductivity Cu2O films and it use in back-surface-field (BSF) designs for low-cost inorganic solar cells; deposition of doped TiO2 and ZnO films for application in hybrid solar cells.