AVS 60th International Symposium and Exhibition
    Thin Film Thursday Sessions
       Session TF+PS-ThM

Paper TF+PS-ThM6
Preparation and Characterization of CVD & ALD Tungsten & Molybdenum Thin Films for CNT-M Metallic Microstructures

Thursday, October 31, 2013, 9:40 am, Room 102 C

Session: Advanced CVD Methods
Presenter: D.D. Allred, Brigham Young University
Authors: D.D. Allred, Brigham Young University
R.R. Vanfleet, Brigham Young University
J.K. Anderson, Brigham Young University
C. Brown, Brigham Young University
R.S. Hansen, Brigham Young University
D. McKenna, University of Notre Dame
R.C. Davis, Brigham Young University
Correspondent: Click to Email
Microelectromechanical systems (MEMS) fabrication traditionally uses the same limited methods and materials as those used in the silicon-based microelectronics industry. In order to make MEMS out of a much richer suite of materials, such as metals, Brigham Young University researchers are investigating chemical vapor infiltration and atomic layer infiltration of patterned carbon nanotube (CNT) forests, using the surface of the carbon nanotubes as nucleation sites for the metal deposition. Our goal has been to fill in the spaces between CNTs by atomistic deposition, thus creating a CNT-composite material possessing the original pattern of the CNT forest. We have investigated two 2 metals: tungsten and molybdenum and 3 precursors: tungsten carbonyl, molybdenum carbonyl and tungsten hexafluoride with hydrogen. molybdenum carbonyl proved to be more successful than tungsten carbonyl for infiltration. As deposited the materials are not pure metals, but contain substantial amounts of carbon and oxygen. As deposited the materials are not pure metals, but contain substantial amounts of carbon and oxygen. E fforts to remove impurities as well as the electrical and mechanical properties of the resulting composite material will be reported . Most recently tungsten fluoride via both CVI and ALI has been used to deposit purer tungsten structures.