AVS 60th International Symposium and Exhibition
    Advanced Surface Engineering Thursday Sessions
       Session SE-ThP

Paper SE-ThP5
Oxidation Resistance and Hardness of CrAlN based Films Deposited by the Arc Ion Plating Method

Thursday, October 31, 2013, 6:00 pm, Room Hall B

Session: Poster Session
Presenter: T. Mori, Keio University, Japan
Authors: T. Mori, Keio University, Japan
T. Suzuki, Keio University, Japan
Correspondent: Click to Email
In the field of hard coatings, oxidation resistance and high hardness of the coatings are among the main concerns. In this study, CrAlSiYN films with various silicon content were synthesized and investigated their oxidation resistance and hardness. The films were deposited on cemented carbide, silicon and SUS304 substrates by the arc ion plating method. X-Ray Diffraction results showed that the CrAlSiYN films had NaCl-type structure. With increasing the silicon content, the lattice paramete rs for cubic CrAlSiYN films decreased from 0.416 nm to 0.413 nm. The solid solubility limit of silicon into CrAlYN film was about 3 at. %. Hardness of CrAlSiYN films was measured using conventional micro-Vickers hardness tester and the result showed that CrAlSiYN films with high Si content exhibited high hardness (about 30 GPa). Using the flow discharge optical emission spectrometry depth profiling method, an oxygen peak was only observed around surface of films after annealed at 1000°C for 1 hour in air. The cross-sectional transmission electron microscopy observation of oxide layer of CrAlSiYN films showed that yttrium stimulated the formation of amorphous oxide, and its silicon or yttrium oxide prevented diffusion of oxygen and metal such as chromium. Incorporation of silicon and yttrium maintained the stable oxidation layer of Cr2O3 or Al2O3 produced at the surface under high temperature and improved oxidation resistance of CrAlN films.