| AVS 60th International Symposium and Exhibition | |
| Advanced Surface Engineering | Thursday Sessions |
| Session SE-ThP |
| Session: | Poster Session |
| Presenter: | T. Masuko, Keio University, Japan |
| Authors: | T. Masuko, Keio University, Japan M. Noborisaka, Keio University, Japan T. Mori, Keio University, Japan A. Shirakura, Keio University, Japan T. Suzuki, Keio University, Japan |
| Correspondent: | Click to Email |
SiOC(-H) films were synthesized on polycarbonate substrates from mixture of trimethylsilane (TrMS) and O2 gases by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) method to improve the abrasion resistance of polycarbonate substrates.
In order to improve the adhesion to polycarbonate substrates, we applied the acrylic intermediate layer prepared by ultraviolet curing method between SiOC(-H) films and polycarbonate substrates. The nanosilica particles were mixed with pentaerythritol triacrylate and pentaerythritol tettraacrylate at various concentrations to control the hardness of the intermediate layer.
The scratch resistance of SiOC(-H) films deposited on polycarbonate substrates with the intermediate layer was improved as the pencil hardness of the intermediate layer increased. After the taber abrasion tests of the SiOC(-H) films deposited on polycarbonate substrates with the intermediate layer, the occurrence of delamination was inspected by digital microscope. The delamination was confirmed to be markedly suppressed as the hardness of the intermediate layer increased.
The haze difference (ΔHaze) between before and after the abrasion tests exhibited sufficient abrasion resistance of 3.5% after 1000 revolutions when the 500 nm thick-SiOC(-H) film was deposited on polycarbonate substrates with the intermediate layer contained 25 wt.% nanosilica particles.