AVS 60th International Symposium and Exhibition
    Electronic Materials and Processing Thursday Sessions
       Session EM-ThP

Paper EM-ThP6
Surface Deactivation of SiO2 using Octadecyltrichlorosilane Based Self-Assembled Monolayers

Thursday, October 31, 2013, 6:00 pm, Room Hall B

Session: Electronic Materials and Processing Poster Session
Presenter: A. Hinckley, University of Arizona
Authors: A. Hinckley, University of Arizona
A.J. Muscat, University of Arizona
Correspondent: Click to Email
Self-assembled monolayers (SAMs) of octadecyltrichlorosilane (OTS) were investigated as a deactivation technique for SiO2 surfaces. Liquid phase chemisorption of OTS has been previously described as a surface modification technique for prevention of atomic layer deposition in selective areas. However, the development of an OTS monolayer with the appropriate density required to fully deactivate the SiO2 surface is extremely sensitive to multiple experimental parameters, including the ambient humidity. This study presents a liquid phase chemisorption method of forming deactivating SAMs in the absence of humidity control. SAMs were deposited both using OTS alone as well as co-adsorbed with trimethylchlorosilane (TMCS) monomers to repair defects in the OTS SAM which might have formed. Monolayers were deposited as a function of solution concentration, solvent, substrate temperature prior to deposition, and hydroxylating solution. Ellipsometric and goniometric results showed that the ideal OTS SAM thickness (26 Å) and water contact angle (110◦) were achieved. X-ray photoelectron spectroscopy was used to probe monolayers for defects in conjunction with TiO­2 atomic layer deposition. High resolution Ti 2p XPS spectra showed that no titanium was bonded to oxygen for up to 100 ALD deposition cycles. In addition, monolayers which initially showed evidence for titanium deposition were passivated via another exposure to the SAM process. This evidence suggests that a fully-deactivated SiO2 surface can be achieved via the use of a secondary TMCS deposition step without the necessary humidity control. Future work includes the use of SAMs in patterned structures and the deposition of an OTS SAM from the vapor phase.