AVS 60th International Symposium and Exhibition
    Applied Surface Science Tuesday Sessions
       Session AS+BI-TuA

Paper AS+BI-TuA10
Temperature-Dependence of Ag Film Roughness and Interlayer Spacings During Deposition on Complex Al-Pd-Mn Surfaces: Comparison with Periodic Substrates

Tuesday, October 29, 2013, 5:00 pm, Room 204

Session: Forensic Science, Art and Archaeology (2:00-3:20 pm)/Quasicrystals and Complex Metal Alloys (4:00-6:00 pm)
Presenter: P.A. Thiel, Ames Laboratory and Iowa State University
Authors: B. Ünal, Massachusetts Institute of Technology
J.W. Evans, Ames Laboratory and Iowa State University
P.A. Thiel, Ames Laboratory and Iowa State University
Correspondent: Click to Email

The morphology of thin metal films deposited on metal substrates is often dominated by kinetic rather than thermodynamic factors . These factors can assessed by studying film characteristics as a function of deposition temperature. In this study, we report a comparison of the roughness of thin Ag films deposited on surfaces of a quasicrystal (five-fold icosahedral Al-Pd-Mn), an approximant of this quasicrystal, and low-index Ag surfaces, at temperatures below and up to ambient. Kinetic effects lead to an increase in roughness with increasing temperature for the Al-Pd-Mn substrates, but a decrease in roughness over the same range on Ag(111) and Ag(100). The nature of these effects is discussed. In addition, we observe that interlayer spacings in the film depend upon layer height, for the Al-Pd-Mn substrates. A useful refined definition of roughness for a system with variable interlayer spacing is addressed.