| AVS 59th Annual International Symposium and Exhibition | |
| Thin Film | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF-WeM1 Optimizing a Spatial Atomic Layer Deposition Cell for High Throughput, Low Temperature, Roll-to-Roll Applications M.J. Dalberth, L. Lecordier, M.J. Sershen, M. Ruffo, R. Coutu, G. Sundaram, J.S. Becker, Cambridge Nanotech, Inc. |
| 8:20am | TF-WeM2 Encapsulation of Implantable Devices by Atomic Layer Deposited Al2O3 and Parylene C Bi-layer X. Xie, L.W. Rieth, F. Solzbacher, University of Utah |
| 8:40am | TF-WeM3 Invited Paper Ultra-barrier Technology for Moisture-Sensitive Electronics P.F. Carcia, DuPont Central Research and Development |
| 9:20am | TF-WeM5 Multilayer Barrier Coatings for Organic Photovoltaics A.M. Coclite, F. De Luca, K.K. Gleason, Massachusetts Institute of Technology |
| 9:40am | TF-WeM6 Preparation of Hydrophobic Coatings on Si/SiO2 by Incorporation of Nano- and Microdiamond in a Layer-By-Layer Deposition A. Diwan, J. Wilcock, M.R. Linford, Brigham Young University |