| AVS 59th Annual International Symposium and Exhibition | |
| Thin Film | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:40am | TF-TuM3 Invited Paper Growth Simulations for Atomic Layer Deposition: Adsorption, Elimination and Densification Reactions S. Elliott, M. Shirazi, Tyndall National Institute, Ireland |
| 9:20am | TF-TuM5 Optimization of Properties of Al-doped ZnO Films Deposited by Atomic Layer Deposition Y. Wu, P.M. Hermkens, B.W.H. van de Loo, H.C.M. Knoops, F. Roozeboom, W.M.M. Kessels, Eindhoven University of Technology, the Netherlands |
| 9:40am | TF-TuM6 Growth Inhibition of Al2O3 on InGaAs by Atomic Layer Deposition B. Granados, A.J. Muscat, University of Arizona |
| 10:40am | TF-TuM9 Nanoindentation and Flexure Related Effects Due to Reactive Subsurface Growth of Atomic Layer Deposition Aluminum Oxide on Polyamide-6 Y. Sun, North Carolina State University, M.P. Goertz, J.A. Palmer, Sandia National Laboratories, R.P. Padbury, J.S. Jur, North Carolina State University |
| 11:00am | TF-TuM10 The Importance of Oxygen-Induced Ripening in the Nucleation of Platinum Atomic Layer Deposition A.J.M. Mackus, M.A. Verheijen, N. Leick, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
| 11:20am | TF-TuM11 Plasma Assisted Atomic Layer Deposition of Pt and PtOx in High Aspect Ratio 3D Structures I.J.M. Erkens, M.A. Verheijen, F. Roozeboom, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |