AVS 59th Annual International Symposium and Exhibition
    Thin Film Wednesday Sessions
       Session TF+SE+NS-WeM

Paper TF+SE+NS-WeM4
Control the Biaxial Texture of Vertically Aligned Nanostructures using Oblique Angle Sputtering Deposition with Substrate Flipping Rotation

Wednesday, October 31, 2012, 9:00 am, Room 11

Session: Glancing Angle Deposition (GLAD)
Presenter: G.-C. Wang, Rensselaer Polytechnic Institute
Authors: G.-C. Wang, Rensselaer Polytechnic Institute
L. Chen, Rensselaer Polytechnic Institute
T.-M. Lu, Rensselaer Polytechnic Institute
Correspondent: Click to Email

It is known that oblique angle deposition can be used to grow 3D nanostructures with a variety of morphology such as nanorods and nanospirals. For a selective set of materials, the technique can also produce a preferred crystal orientation, particularly a biaxial texture where the texture selection occurs in both the out-of-plane and in-plane directions. Most frequently biaxial texture created using the oblique angle deposition is in the form of slanted nanorods. It is desirable to produce a biaxial structure in the form of vertically aligned nanostructures which may be useful as a buffer layer to grow functional films on top of it. In this talk we will discuss several strategies to grow vertically aligned nanostructures including nanorods with a biaxial texture by dynamically varying the incident flux angle with respect to the surface normal during deposition. A particularly robust technique to achieve this goal is a flipping rotation scheme where the substrate is rotated continuously at a fixed speed around an axis lying within and parallel to the substrate [1]. This is very different from the conventional substrate rotation mode where the rotational axis is perpendicular to the substrate surface. In the flipping rotational mode the incident flux is perpendicular to the rotational axis, and the incident flux angle changes continuously. Mo vertical nanorod films, grown on amorphous substrates under three orders of magnitude different rotation speeds, different flipping directions, and different ending deposition angles, were characterized using scanning electron microscopy. For texture characterization of these Mo nanostructures we used our newly developed reflection high energy electron diffraction surface pole figure technique [2]. Despite very different morphologies, such as 'C'-shaped, 'S'-shaped, and vertically aligned nanorods grown by the flipping rotation, the same (110)[1-10] biaxial texture with an average out-of-plane dispersion of ~15° was observed. In contrast, we showed that only a fiber-textured Mo film was obtained by using the conventional rotation mode with a fixed incident flux angle. These biaxial Mo vertical nanorod films have potential applications as buffer layers to grow near-single crystal semiconductor films through nanoheteroepitaxy. These films may find important applications in energy conversion and light emitting devices.

Work was supported by the NSF DMR-1104786.

[1] L. Chen, T.-M. Lu, and G.-C. Wang, Nanotechnology 22, 505701 (2011).

[2] F. Tang, T. Parker, G.-C. Wang, and T.-M. Lu, J. of Physics D: Applied Physics 40, R427 (2007).