AVS 59th Annual International Symposium and Exhibition
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP20
Insulating Si(111) Surfaces by Organic Fluorine Compound Molecular Monolayer

Tuesday, October 30, 2012, 6:00 pm, Room Central Hall

Session: Surface Science Poster Session
Presenter: F.Y. Tian, University of Delaware
Authors: F.Y. Tian, University of Delaware
A.V. Teplyakov, University of Delaware
Correspondent: Click to Email
Both trifluoroethylamine (TFEA) and p-fluoroaniline (pFA) were modified on Si(111) surfaces as insulators by forming Si-N bond through wet-chemistry. Fluorine functional groups are good chemical building block and tracking label for X-ray photon spectroscopy (XPS). Infrared spectroscopy (IR) was also employed to identify the surface Si-N bonding information. The experiment strategy is starting from native oxidized silicon (111) wafers, hydrogen-terminated Si(111) samples were obtained through modified RCA cleaning method and HF/NH4F etching. Then, the H-Si(111) wafers were treated with PCl5 to get Cl-terminated Si(111) surfaces. Finally, the samples were reacted in TFEA and pFA/THF solution, respectively, at inert atmosphere at room temperature for a variety reaction period. The formation of molecular monolayer of TFEA and pFA was confirmed by both XPS and IR. Density functional theory (DFT) was also applied to mimic both TFEA and pFA’s behavior on Si(111) surfaces. In addition, due to various basicity and electron drawing capabilities, TFEA and pFA presented different reactivity towards Cl-terminated Si(111) surfaces.