| AVS 59th Annual International Symposium and Exhibition | |
| Advanced Surface Engineering | Monday Sessions |
| Session SE+NS-MoA |
| Session: | Nanostructured Thin Films and Coatings II: Multifunctional Properties |
| Presenter: | A.G. Kolosko, A.F. Ioffe Physico-Technical Institute, Russian Federation |
| Authors: | E.O. Popov, A.F. Ioffe Physico-Technical Institute, Russian Federation A.G. Kolosko, A.F. Ioffe Physico-Technical Institute, Russian Federation M.V. Ershov, A.F. Ioffe Physico-Technical Institute, Russian Federation S.V. Filippov, A.F. Ioffe Physico-Technical Institute, Russian Federation |
| Correspondent: | Click to Email |
It is obvious that research I-V characteristics remains the basic criterion of an estimation of field emission process. However the techniques, allowing to do exhaustive conclusions about the physical processes occurring on nano dimensional emission sites by macroscopical values of a current and voltage does not exist yet. Especially it is expressed at research of dynamics of field emission, the phenomena accompanying functioning flat multitips cold cathodes (emitters).
Attempts to observe other phenomena that can accompany emission processes, except for observation of I-V characteristics, are being made. There are the registration of radiation of the emitter and the anode, heating of electrodes, change of vacuum conditions, mass spectrometer researches. Application of computer processing during record I-V characteristics opens additional possibilities of knowledge of evolution and emitter work, allows to approve models of physical processes is directly during emission experiment.
In our work was developed the technique of multichannel record and in situ data processing about evolution of field emitters. On-line processing of signals is performed on the basis of own program written on Labview 10. The technique includes multichannel system of gathering of signals of a current and voltage, record of vacuum values and temperature. As a part of mass spectrometer installation the given system collects the data about kinetics allocation of the volatile products accompanying emission process. Data for representation in a kind convenient for the analysis is in addition processed: beta values of field increasing, active resistance of inter-electrode gap, visualization of height of emitters and the estimation of a total emitting surface and number of the emission centers is made.
Some characteristic areas in dependence SK [1,2] which are treated as desorption gases from surface MWNT, area of growth of number of sites without change of the geometrical sizes (almost vertical growth SK), area of smooth change of geometry of the emitter (increase in intensity of a field and increase in the area of the emitter - intercept increasing) have been found out.
[1] M. Kawasaki, Z. He, Y. Gotoh, H. Tsuji, J. Ishikawa, J. Vac. Sci. Technol. B 28, (2010) C2A77.[2] E.O.Popov, M.V. Ershov, IEEE, 24th INVC, Wuppertal, (2011) 158.