AVS 59th Annual International Symposium and Exhibition
    Nanometer-scale Science and Technology Thursday Sessions
       Session NS-ThP

Paper NS-ThP11
Preparation of Metal Nanoparticles within Mesoporous Silica via Solution Plasma Process (SPP)

Thursday, November 1, 2012, 6:00 pm, Room Central Hall

Session: Nanometer-scale Science and Technology Poster Session
Presenter: W. Yaowarat, Nagoya University, Japan
Authors: W. Yaowarat, Nagoya University, Japan
N. Saito, Nagoya University, Japan
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Recently, nanoparticles within mesoporous silica have been extensively studied due to their significant physicochemical characteristic. It is widely used in various applications such as instant microbial inhibition, sensor, catalyst, and electronic devices. As previously reported that nanoparticles within mesoporous silica could be synthesized by chemical treatment and calcination. However, high temperature and long time treatment must be required.

Solution plasma process (SPP) is a new plasma system which could be used to synthesis metal nanoparticles. SPP is superior to other conventional methods, in term of ease of handling, low temperature, and short time treatment. It is therefore of our interest to apply the solution plasma process to prepare metal nanoparticles within mesoporous silica. The voltage, frequency and pulse width of solution plasma conditions were fixed at 1.6 kV, 15 KHz, and 2 µs, respectively. 1 mM of AgNO3 solution with 0.2 g mesoporous silica was treated with solution plasma for 15 minutes. The plasma-treated sample was filtrated prior to air dry for overnight. The dried sample was characterized by transmission electron microscopy (TEM). The TEM results showed that the silver nanoparticles could be performed during solution plasma treatment and filled within nanoscale channels of mesoporous silica matrix. This suggested that the solution plasma process could be a potential method for prepare metal nanoparticles within mesoporous silica.