AVS 59th Annual International Symposium and Exhibition
    Nanomanufacturing Science and Technology Focus Topic Tuesday Sessions
       Session NM+MS-TuM

Invited Paper NM+MS-TuM1
Challenges of Nanomanufacturing from an Industrial Perspective

Tuesday, October 30, 2012, 8:00 am, Room 16

Session: All Invited Session: Challenges of Nanomanufacturing from an Industrial Perspective
Presenter: A. Sekiguchi, Tokyo Electron Limited
Correspondent: Click to Email
In the semiconductor industry, we have been able to benefit from cost reductions associated with physical scaling of memory and logic devices for decades. By reducing the physical dimensions of our devices from generation to generation, we have been able to drive bit cost of memory and processing power cost of our logic devices with ease. Today however, challenges associated with atomic scale manufacturing and control are daunting, to say the least. Dimensional controls are in the single nm range, six sigma, for lateral scales, and in the sub-Angstrom range for critical film thicknesses. The talk will describe the device level challenges that we face in this era of nano-scale manufacturing, explore options that we have in terms of patterning at 1x nm node and below, and discuss process options that will be needed in the next generation of devices.