AVS 59th Annual International Symposium and Exhibition
    Exhibitor Technology Spotlight Tuesday Sessions
       Session EW-TuM

Paper EW-TuM7
ORION Nanofab: Fabricating sub 10 nm Nanostructures using the Helium Ion Microscope

Tuesday, October 30, 2012, 10:00 am, Room West Hall

Session: Exhibitor Technology Spotlight
Presenter: D. Elswick, Carl Zeiss
Correspondent: Click to Email

The helium ion microscope (HIM) takes advantage of an atomically sharp source to emit a beam of focused He ions so the microscopist today can go beyond imaging resolutions achieved in the Scanning Electron Microscope (SEM). Imaging with ions rather than electrons offers many advantages including the ability to image uncoated non conducting samples at high resolution without damage. Additionally, helium ions can be used to sputter material for nanolithography and nanopatterning applications where sub 10 nm structures are desired. A gallery of helium ion microscopy results will be presented to showcase the capability and performance of this novel microscope. The HIM has proven invaluable at characterizing uncoated biological samples as well as other soft materials. Features sizes and material removal via conventional Ga FIB systems is now surpassed using HIM. The HIM-FIB has touched a wide array of applications that range from nanomachining 5 nm pores for single molecule detection to patterning devices in graphene and creating nanophotonic devices in thin films.