AVS 58th Annual International Symposium and Exhibition
    Thin Film Division Tuesday Sessions

Session TF-TuA
ALD: Fundamental Reactions and Film Properties

Tuesday, November 1, 2011, 2:00 pm, Room 107
Moderator: Steven M. George, University of Colorado, Boulder


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm TF-TuA1
Indium Oxide Atomic Layer Deposition Facilitated by the Synergy between Oxygen and Water
J.A. Libera, J.N. Hryn, Jeffrey Elam, Argonne National Laboratory
2:20pm TF-TuA2
Engineering AlN Thin Films by Atomic Layer Deposition on Wide Bandgap Semiconductors as Gate Dielectric
Ya-Chuan Perng, J.P. Chang, University of California Los Angeles
2:40pm TF-TuA3 Invited Paper
Paul Holloway Award Lecture - Gas-Surface Interactions during Atomic Layer Deposition
Sumit Agarwal, Colorado School of Mines
4:00pm TF-TuA7 Invited Paper
Mechanical Properties of ALD Thin Films
Helmut Baumgart, Old Dominion University
4:40pm TF-TuA9
Effect of Atomic Layer Deposition on the Mechanical Properties of Synthetic Nonwoven and Electrospun Polymer Fibers
Christina Devine, C.J. Oldham, J.S. Jur, G.N. Parsons, North Carolina State University
5:00pm TF-TuA10 Invited Paper
In Situ Studies of Oxide ALD for Crystalline Oxide Growth on Silicon
Brian Willis, H. Wang, University of Connecticut, C. Zhang, Chinese Academy of Sciences, China, X. Jiang, University of Connecticut
5:40pm TF-TuA12
Nucleation and Interface Formation of Al2O3 on HF-treated InGaAs(100) by Atomic Layer Deposition
A.J. Muscat, Bernal Granados, F.L. Lie, University of Arizona