AVS 58th Annual International Symposium and Exhibition | |
Thin Film Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | TF-MoA1 Invited Paper Atmospheric ALD of Al2O3 for a High Throughput c-Si Solar Cell Passivation Vladimir Kuznetsov, P. Vermont, E.H.A. Granneman, Levitech BV, Netherlands |
2:40pm | TF-MoA3 Atomic Layer Deposition of Al2O3 for Quantum Computing Alexander Kozen, M. Khalil, B. Sarabi, K.D. Osborn, University of Maryland, College Park, C. Musgrave, University of Colorado, Boulder, C. Lobb, G.W. Rubloff, University of Maryland, College Park |
3:00pm | TF-MoA4 Supported Core-Shell Pt-Pd Nanoparticles Synthesized by Atomic Layer Deposition Matthieu Weber, A.J.M. Mackus, Eindhoven University of Technology, Netherlands, M.A. Verheijen, C. van der Marel, Philips Innovation Services, Netherlands, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
3:40pm | TF-MoA6 Photoluminescence Characteristics of TiO2 Film Deposited on Vertically Oriented Si Nanowire by Remote Plasma Atomic Layer Deposition Jaesang Lee, T.Y. Park, Y.B. Ko, H.Y. Jeon, J.G. Park, J.H. Ryu, H.T. Jeon, Hanyang University, Republic of Korea |
4:00pm | TF-MoA7 Fast Atomic Layer Deposition for High Throughput and Low Temperature Applications Paul Poodt, A. Illiberi, M. Smets, R. Knaapen, TNO, Netherlands, F. Roozeboom, TNO & Eindhoven University of Technology, Netherlands, A. van Asten, TNO, Netherlands |
4:20pm | TF-MoA8 Industrial ALD Equipment for PV and OLED Applications Matti Putkonen, Beneq Oy, Finland |
4:40pm | TF-MoA9 Conductive Coatings on Nonwoven Fiber Mats by Atomic Layer Deposition William Sweet, J.S. Jur, G.N. Parsons, North Carolina State University |
5:00pm | TF-MoA10 ALD IrOx Thin Film to Improve Microelectrode Array Performance in Stem Cell Applications T. Ryynänen, J. Lekkala, Tampere University of Technology, Finland, L. Ylä-Outinen, S. Narkilahti, University of Tampere, Finland, J. Hämäläinen, M. Leskelä, University of Helsinki, Finland |