AVS 58th Annual International Symposium and Exhibition
    Thin Film Division Monday Sessions

Session TF-MoA
Emerging ALD Applications

Monday, October 31, 2011, 2:00 pm, Room 107
Moderator: Giovanna Scarel, James Madison University


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm TF-MoA1 Invited Paper
Atmospheric ALD of Al2O3 for a High Throughput c-Si Solar Cell Passivation
Vladimir Kuznetsov, P. Vermont, E.H.A. Granneman, Levitech BV, Netherlands
2:40pm TF-MoA3
Atomic Layer Deposition of Al2O3 for Quantum Computing
Alexander Kozen, M. Khalil, B. Sarabi, K.D. Osborn, University of Maryland, College Park, C. Musgrave, University of Colorado, Boulder, C. Lobb, G.W. Rubloff, University of Maryland, College Park
3:00pm TF-MoA4
Supported Core-Shell Pt-Pd Nanoparticles Synthesized by Atomic Layer Deposition
Matthieu Weber, A.J.M. Mackus, Eindhoven University of Technology, Netherlands, M.A. Verheijen, C. van der Marel, Philips Innovation Services, Netherlands, W.M.M. Kessels, Eindhoven University of Technology, Netherlands
3:40pm TF-MoA6
Photoluminescence Characteristics of TiO2 Film Deposited on Vertically Oriented Si Nanowire by Remote Plasma Atomic Layer Deposition
Jaesang Lee, T.Y. Park, Y.B. Ko, H.Y. Jeon, J.G. Park, J.H. Ryu, H.T. Jeon, Hanyang University, Republic of Korea
4:00pm TF-MoA7
Fast Atomic Layer Deposition for High Throughput and Low Temperature Applications
Paul Poodt, A. Illiberi, M. Smets, R. Knaapen, TNO, Netherlands, F. Roozeboom, TNO & Eindhoven University of Technology, Netherlands, A. van Asten, TNO, Netherlands
4:20pm TF-MoA8
Industrial ALD Equipment for PV and OLED Applications
Matti Putkonen, Beneq Oy, Finland
4:40pm TF-MoA9
Conductive Coatings on Nonwoven Fiber Mats by Atomic Layer Deposition
William Sweet, J.S. Jur, G.N. Parsons, North Carolina State University
5:00pm TF-MoA10
ALD IrOx Thin Film to Improve Microelectrode Array Performance in Stem Cell Applications
T. Ryynänen, J. Lekkala, Tampere University of Technology, Finland, L. Ylä-Outinen, S. Narkilahti, University of Tampere, Finland, J. Hämäläinen, M. Leskelä, University of Helsinki, Finland